Ground Quartz Cover Ring 12 Inch CCP Plasma Etching Quartz Ring for Dry Etch

This Ground Quartz Cover Ring is a high purity synthetic quartz plasma etching quartz ring built for 12 inch CCP dry plasma etching equipment. Positioned at the wafer perimeter, the ring confines the plasma sheath, shields the chamber edge and protects the wafer from edge erosion during long, high power etch steps. Because it is machined from synthetic fused quartz rather than natural quartz, the ring offers an exceptionally low level of metallic and hydroxyl contamination, which is critical for advanced dielectric and conductor etch processes. The ring is ground on all critical surfaces to hold tight flatness and diameter tolerances, ensuring consistent electrical behaviour and repeatable process results from chamber to chamber. Each ring is finished and packed in a Class 100 clean room before shipment.

• High Purity Synthetic Fused Quartz: The plasma etching quartz ring is produced from synthetic fused quartz with a very low hydroxyl and metallic content, reducing the risk of contamination during sensitive etch steps.
• Precision Ground Ring Faces: Critical surfaces are ground and lapped to hold ±0.01 mm on diameter and tight flatness, so the ring seats squarely on the CCP electrode assembly.
• 12 Inch CCP Compatibility: The geometry is dimensioned for 12 inch CCP etch chambers, matching the OEM cover ring interface without any adaptation.
• Uniform Plasma Sheath Control: By controlling the perimeter boundary, the ring stabilises the plasma sheath and helps keep edge etch rate uniform across the wafer.
• Class 100 Chemical Cleaning: Every ring is acid cleaned and packed in a Class 100 clean room to minimise particle adders in the reaction chamber.
• Long Service Life: Synthetic quartz combines thermal shock resistance with strong plasma erosion resistance, extending the interval between preventive maintenance cycles.
• Custom Drawing Support: Custom diameters, step profiles and fire polished finishes are available from your drawings, quoted within one to two days.

The Ground Quartz Cover Ring is specified for 12 inch CCP dry plasma etching tools, including dielectric etch, conductor etch and plasma strip modules. In these systems the ring sits at the wafer edge to protect the lower electrode and the chamber wall from plasma attack, while its electrically insulating surface helps shape the plasma sheath. Synthetic fused quartz makes the ring suitable for demanding chemistries where natural quartz could contribute unwanted metallic contamination. Etch engineers also fit this plasma etching quartz ring as a cost effective replacement for worn OEM parts, restoring edge uniformity and reducing particle excursions between wet cleans.

Every Ground Quartz Cover Ring is measured against the approved drawing using coordinate measuring machines, digital microscopes, a surface roughness tester, height gauges and calipers, following a written SOP so that inspection is repeatable. Finished rings are acid cleaned, dried and sealed in a clean plastic bag, then packed in a blue corrugated box inside a master carton for international shipment. Standard delivery is 30 to 45 days, and monthly capacity exceeds 1,000 pieces, which supports blanket and scheduled release orders. We ship FOB Shanghai by default and can quote EXW, CFR, CIF, DDP and DAP on request, with payment by T/T, L/C, D/A or D/P. Send your technical drawing with the enquiry and our engineers will respond with a quotation within one to two days.